QuantumATK Forum
QuantumATK => General Questions and Answers => Topic started by: tara on January 29, 2015, 13:48
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Is there any particular preference for using Bassani.Si_Basis set for all silicon p-i-n device structure as used in
http://quantumwise.com/publications/tutorials/item/828-silicon-p-n-junction ??
Using Bassani.Si_Basis basis set ,it takes much more Slater koster device calculation time as compared to Vogl.Si_Basis basis set .
Secondly, would there be any improvement in convergence at higher bias =0.8v using Bassani.Si_Basis basis set??
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The Vogl parameterization is rather rudimentary, it only contains sp3 orbitals, whereas Bassani (or Jancu et al., there are several authors on the paper) created a sp3d5s* model for Si and other semiconductors to make it more accurate. And it is - Vogl is well known to not describe the Delta valley of Si very well at all, and I think you will notice that esp. at high bias.
There have since been published improvements to the Jancu-Bassani models, in particular by Boykin, Klimeck et al., but they mainly adjust details.