Author Topic: Fringe field effect  (Read 4562 times)

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Offline ramkrishna

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Fringe field effect
« on: February 20, 2017, 21:29 »
Hi,
In the current NEGF, does it consider the effect of fringe field of a gated device? If so, can you please let me know the formalism of that?

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Ramkrishna

Offline Jess Wellendorff

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Re: Fringe field effect
« Reply #1 on: February 21, 2017, 07:57 »
Could you explain what you mean by "fringe field"?

Offline ramkrishna

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Re: Fringe field effect
« Reply #2 on: February 21, 2017, 18:17 »
Normally the flux lines inside the gates are uniform and parallel in MOSFETs. But at the edges, the flux lines are not straight and bend slightly upward due to the geometry. This extended field (nonlinear) at the sidewall is the fringing field. In the literature, there are many references of fringe field, especially in the context of short channel effect in MOSFETs.

Offline Jess Wellendorff

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Re: Fringe field effect
« Reply #3 on: February 22, 2017, 08:27 »
Electrostatic gates in ATK NEGF are regions in space with a constant potential. If the fringe field is a purely electrostatic effect, then yes, it should be included. I have attached an image of the electrostatic difference potential for a gated nanoribbon, with gate potentials 0 V below and 1 V above.

Offline ramkrishna

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Re: Fringe field effect
« Reply #4 on: February 24, 2017, 22:30 »
Hi Jess,
Thank you for the clarification. I have another query on this. Is it possible to calculate this fringe capacitance?

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Ramkrishna

Offline Petr Khomyakov

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Re: Fringe field effect
« Reply #5 on: February 27, 2017, 22:27 »
Do you mean whether it is possible to calculate it in ATK? There is no such a feature in ATK. But you may use, in principle, the electrostatic difference potential (EDP) from ATK for the capacitance calculation in a customary python script if you know the definition of this capacitance in terms of EDP.