ok thank you i just want to make sure i understand correctly ..
i have another question . my understanding is that when making changes to atoms, such as i am doing with selective doping locations, .. you need to optimize the geometry in order to get a realistic structure .. my understanding is that although you can specify atoms in any position, that that is not realistic unless you let the optimizer relax the forces, etc .. in order to make a "Stable" configuration, for lack of a better word ... is this a correct understanding, and is it safe to say optimization has to be done always when making precise atomic level changes to structures like nanoribbons?
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i found this statement in the tutorial here:
http://quantumwise.com/documents/tutorials/latest/ATKTutorialDevice/index.html/chap.relax.html"Applying a finite bias will cause the position of atoms to shift slightly, so the geometry should in principle also be optimized under bias. However, the optimization under bias can be very time consuming and usually only has little effect on the transmission and is thus often omitted."
Now, i am concerned about the "usually" statement ... do you think it is possible the results i am seeing for current versus Vgs that i posted earlier could be beacause i am not optimizing after doping the electrodes?
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and one more question ...
what i am doing is creating p-i-n tfet GNR structures, doped with N and B in the electrodes ... i am running bandstructure and transmission calcs ... now:
(1) should i optimize geometry after replaceing carbon atoms with N and B?
(2) when should I optimize? (before bandstructure calc? before trans calc? before any calc? ) I want to reduce time but be accurate
(3) as noted above, i see that it seems i would need to re-optimize under each bias ... does this include different gate voltages, or just Vds bias?
ed
thank you