hi
I'm trying to simulate a SiNWFET and i need to dope source/drain regions. Could you possibly tell me that how can I define dopping in source/drain regions? for example: donor doping / 1*10^20 cm^-3. the problem is that i do not know how to calculate the number which i have to add in editor code.
in one of the tutorials of quantumwise.com , it was mentioned that:
[http://www.quantumwise.com/documents/tutorials/latest/NanowireDevice/index.html/chap.nanowiredevice.html ]
"The electrode is about 1 nm long and has a cross section of (0.5 nm)x(0.5 nm), so the added charge (charge=0.01) corresponds to an effective doping level of around 4*10^19 cm^-3".
what is the relation between 0.01 and 4*10^19 cm^-3? any formula? for 1*10^20 cm^-3, how can i compute the number? the primitive vectors of the electrodes in my device are the same and as follow:
A 31.746 0 0
B 0 31.746 0
C 0 0 6.257
(ALL IN ANGESTROM)
thanks