Dear experts,
Hi,
I have calculated the Projected local density of states (PLDOS) for a GNR device, with left/right electrodes&extensions p-doped and n-doped, respectively. The device and the corresponding PLDOS are shown as follows:
The PLDOS looks very reasonable since the left and right sides are p-doped and n-doped, the Fermi Level increase at the left side and decrease at the right side, while for the remaining undoped middle part, the Fermi level is at the middle. (Attached file test2.py)
Then I tried to include a gate in the middle without applying any gate voltage, and also calculated the PLDOS, their are shown as follows: (Attached file test3.py)
You can notice that just by introduce a gate in the middle, the Fermi level of the middle region increase to be the same as the left side. Why could this happen even when there is no gate voltage at all?
Initially I thought this could be some kind of Fermi level pinning effect, but I rejected this thought later since Fermi level pinning occurs where there is a surface state ( between semiconductor and Vacuum or between semiconductor and metal). But in my device there is no surface state in the middle.
I am stuck in interpreting this result and cannot understand what is the effect of the very existence of a gate region in my device. Can you help me explain it?
Any help will be appreciated!