If you scroll down...... at the end of the tutorial...you will find the relevant References___
[1] Geng Li et al. "Ab Initio Modeling of Schottky-Barrier Height Tuning by Yttrium at Nickel Silicide/Silicon Interface" IEEE ELECTRON DEVICE LETTERS 29, 746 (2008)
[2] Geng Li et al. "Fermi Level Unpinning and Schottky Barrier Modification by Ti, Sc and V Incorporation at NiSi2/Si Interface" CHINESE PHYSICS LETTERS 26, Issue 3 (2009)
[3] Geng Li et al. "Image Charge and Dipole Combination Model for the Schottky Barrier Tuning at the Dopant Segregated Metal/Semiconductor Interface" IEEE ELECTRON DEVICE LETTERS 30, 963 (2009)
[4] E. Kasper, D.J. Paul "Silicon Quantum Integrated Circuits" Springer Science & Business Media, Mar 30, 2006.
[5] M. Brandbyge, J.-L. Mozos, P. Ordejón, J. Taylor, and K. Stokbro, "Density-functional method for nonequilibrium electron transport" Phys. Rev. B 65, 165401 (2002)
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Besides, it's worth mentioning.___
Almost a similar kind of problem...though that is for Metal-S.C. ...has already been reported in....
http://pubs.acs.org/doi/abs/10.1021/nl403465vAtleast, you can go through the metodology that they followed...!!!
Regards_
Dipankar